Note: Thermal analog to atomic force microscopy force-displacement measurements for nanoscale interfacial contact resistance
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چکیده
منابع مشابه
Note: Thermal analog to atomic force microscopy force-displacement measurements for nanoscale interfacial contact resistance.
Thermal diffusion measurements on polymethylmethacrylate-coated Si substrates using heated atomic force microscopy tips were performed to determine the contact resistance between an organic thin film and Si. The measurement methodology presented demonstrates how the thermal contrast signal obtained during a force-displacement ramp is used to quantify the resistance to heat transfer through an i...
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ژورنال
عنوان ژورنال: Review of Scientific Instruments
سال: 2010
ISSN: 0034-6748,1089-7623
DOI: 10.1063/1.3361157